Company profile
Moorfield Nanotechnology
Cheshire manufacturer of compact deposition, etch and anneal thin-film systems used in semiconductor, graphene and two-dimensional materials research and pilot production; part of listed group Judges Scientific.
Company overview
Moorfield Nanotechnology, based in Knutsford, Cheshire, manufactures compact and modular systems for thin-film deposition, etching, and annealing. Its product range is designed for research and development, academic research, prototyping, and small-batch pilot production workflows, helping to bridge the gap between laboratory-scale work and larger fabrication facilities. The company supplies physical vapour deposition (PVD) systems for sputtering and evaporation, chemical vapour deposition (CVD) tools, and platforms for reactive-ion etching (RIE), plasma processing, and thermal annealing. These systems are used in applications such as semiconductor prototyping, advanced materials research, and the development of graphene, 2D materials, and nanomaterials. Moorfield Nanotechnology is part of Judges Scientific plc, a group listed on the London Stock Exchange, and serves a global customer base in academia and industry through a network of distributors.
Semiconductor activity
Primary capability: Semiconductor Manufacturing Equipment. Supply-chain role: R&D Equipment, Pilot Production Equipment.
Technologies and capabilities
- Silicon
- Graphene / 2D Materials
- Nanomaterials
- Semiconductors
- Thin-Film Solar
- Organic Electronics
- Quantum Dots
- Sputtering Targets
- Metals
- Organic Materials
- Dielectrics
- Graphene
Physical Vapour Deposition Systems; Chemical Vapour Deposition Systems; Plasma Etching Systems; Thermal Annealing Systems; Sputtering Targets
Markets served
- Research & Development
- Academia
- Semiconductors
- Advanced Materials
- Sensors
- Solar Cells
UK presence
Knutsford, Cheshire. Part of the North West cluster.
Research links: University of Cambridge, University of Liverpool, University of Oxford, MRC Laboratory of Molecular Biology.